Electron and ion beams are widely used for both qualitative and quantitative analysis of semiconductor materials and devices. They can be used to image structures with sub-nm resolution and to provide information about elemental composition and dopant concentration. This course describes the fundamentals of electron and ion beam characterization and includes a project that analyzes the surface roughness of a solar cell.


Electron and Ion Beam Characterization
本课程是 Semiconductor Characterization 专项课程 的一部分

位教师:Trevor Thornton
包含在 中
您将学到什么
Explain the interaction of electron and ion beams with semiconductor materials.
Describe the constituent components of electron and ion beam characterization systems.
Describe applications of electron and ion beam characterization.
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要了解的详细信息

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5 项作业
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该课程共有5个模块
Electron and ion beams are widely used for both qualitative and quantitative analysis of semiconductor materials and devices. They can be used to image structures with sub-nm resolution and to provide information about elemental composition and dopant concentration. This course describes the fundamentals of electron and ion beam characterization and includes a project that analyzes the surface roughness of a solar cell.
涵盖的内容
1个视频2篇阅读材料
This week introduces the concepts of scanning electron microscopy and how it is used for both qualitative and quantitative sample analysis.
涵盖的内容
2个视频1篇阅读材料1个作业
This week, you will learn about Auger electron emission spectroscopy, a powerful technique for surface analysis.
涵盖的内容
3个视频1篇阅读材料1个作业
This week, you will learn about secondary ion mass spectroscopy and how it is used to measure the concentration and distribution of constituent materials in semiconductors.
涵盖的内容
2个视频1篇阅读材料1个作业
This week, you will complete a case study to assess your ability to use images obtained from an SEM for quantitative surface analysis.
涵盖的内容
1个视频2个作业
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