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学生对 Arizona State University 提供的 Optical and X-Ray Characterization 的评价和反馈
26 个评分
课程概述
Optical and X-ray techniques are powerful ways to characterize semiconductor thin films. They can be used to measure film thickness, purity and crystalline quality, and for compositional analysis. Modern techniques are fast, turn-key, and generally non-destructive, allowing for rapid assessment of material properties. This course describes the fundamentals of optical and X-ray characterization and provides real-world examples of how they are used in semiconductor manufacturing.
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1 - Optical and X-Ray Characterization 的 7 个评论（共 7 个）
创建者 Kuna L N
•May 9, 2024
Quick introduction and review of important topics. I wish if more such courses are introduced.
创建者 Roy D M S
•Jan 11, 2025
Excellent course; I have learned a lot, thanks
创建者 Carter H
•May 14, 2024
Very practical and useful, thanks!
创建者 Mike B
•Apr 7, 2025
Enjoyed the courses very much!
创建者 ZAHID U
•Dec 18, 2023
best course
创建者 Haroon K
•Jul 26, 2025
v.good
创建者 Ian B
•Jun 9, 2024
I do semiconductor and materials characterization for a living. so this course was too basic in my opinion, its an ok introduction to some of the instruments. Would be nice if there was more exercises like the one used for the solar cell roughness project.